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just_another_person@lemmy.world to Technology@lemmy.worldEnglish · 1 day ago

China Has Reportedly Built Its First EUV Machine Prototype, Marking a Semiconductor Breakthrough the U.S. Has Feared All Along

wccftech.com

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China Has Reportedly Built Its First EUV Machine Prototype, Marking a Semiconductor Breakthrough the U.S. Has Feared All Along

wccftech.com

just_another_person@lemmy.world to Technology@lemmy.worldEnglish · 1 day ago
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  • T4V0@lemmy.pt
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    1 day ago

    Found it! Nano Imprint Lithography (NIL).

    • SaveTheTuaHawk@lemmy.ca
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      8 hours ago

      Ok in a lab, but saying they will scale by 2027 is pure fiction.

    • justaman123@lemmy.world
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      14 hours ago

      Can someone smarter than me or at least more informed explain how this compares

    • eleijeep@piefed.social
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      1 day ago

      Thanks. Oh yes, I heard about this technology (but not the latest update) from a youtube video. It’s completely insane!

      https://www.youtube.com/watch?v=8UdNB3ZY4Ks

      • dubyakay@lemmy.ca
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        20 hours ago

        Insanely good or Insanely stupid?

        • eleijeep@piefed.social
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          12 hours ago

          It has its pros and cons. Pros are that it’s faster and uses less energy and no complex optics system. Cons are that they have to replace the masks fairly regularly because they degrade with each imprint made. This probably also means that yields are lower towards the end of the life of the mask.

          • SaveTheTuaHawk@lemmy.ca
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            8 hours ago

            Huge QC fail rates. Will not scale well.

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